#sputter coater
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hemipteran · 2 years ago
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pramoja · 2 years ago
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bhoyarankita1510 · 5 months ago
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marketmavenresearch · 6 months ago
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perceptiqdata · 6 months ago
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marketresearchnetwork · 6 months ago
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anatechusa · 7 months ago
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Precision Sputter Coating Machine
Cutting-edge sputter coating system for high-precision deposition, enhancing materials with thin film layers for advanced scientific and industrial applications.Visit website - https://anatechusa.com/sputter-coaters 
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quience123 · 1 year ago
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vjinstruments · 1 year ago
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Exploring R&D Coaters, Radial Arm Mazes, and Table Coaters: The Evolution of Coating Technologies
Introduction:
In today's fast-paced world, innovation is the key to success. The realm of coating technologies has witnessed remarkable advancements over the years, with R&D coaters, radial arm mazes, and table coaters emerging as notable solutions. In this blog post, we will delve into these cutting-edge technologies, their applications, benefits, and the impact they have had on various industries.
 R&D Coater
The R&D coater is a versatile equipment widely used in research laboratories and manufacturing facilities. It provides a controlled environment for the application of coatings to various materials, allowing scientists and engineers to analyze and optimize the coating process. Whether it's for pharmaceuticals, electronics, or industrial materials, an R&D coater plays a vital role in achieving consistent and high-quality coatings.
The R&D coater offers precise control over coating parameters such as thickness, speed, and temperature. Researchers can experiment with different coating materials and formulations to evaluate their performance. This enables the development of improved products, enhanced functionality, and better durability. With an R&D coater, scientists can conduct thorough investigations and make informed decisions regarding the coatings applied to their prototypes or products.
Applications of R&D Coaters
Automotive Industry:
R&D coaters are instrumental in developing advanced coatings for automotive components, improving their resistance to corrosion, abrasion, and UV degradation.
Electronics Industry:
With the growing demand for flexible and wearable electronics, R&D coaters enable the development of thin and conformal coatings that provide protection and functionality to electronic devices.
Medical Field:
R&D coaters aid in the development of medical coatings, such as biocompatible materials for implants and drug delivery systems, enhancing patient outcomes and safety.
Radial Arm Maze
In the field of behavioral research, the radial arm maze is a valuable tool for studying learning and memory in animals. This maze consists of a central hub with several arms radiating outwards, each containing rewards or punishments. By navigating through the maze, animals learn to associate specific arms with positive or negative outcomes, revealing insights into their cognitive abilities.
Researchers utilize the radial arm maze to investigate spatial memory, decision-making processes, and the effects of experimental manipulations on learning and memory. Through careful observation and data collection, scientists gain a better understanding of neurological disorders, such as Alzheimer's disease or schizophrenia, and explore potential therapeutic interventions. The radial arm maze serves as an essential experimental apparatus in behavioral neuroscience, aiding researchers in unraveling the complexities of the brain.
Significance of Radial Arm Mazes:
Memory Research:
Radial arm mazes help scientists understand the mechanisms behind memory formation, retention, and retrieval, shedding light on conditions like Alzheimer's disease and age-related cognitive decline.
Drug Development:
Pharmaceutical researchers employ radial arm mazes to evaluate the effects of drugs on memory and learning, aiding in the development of treatments for memory-related disorders.
Animal Behavior Studies:
By observing an animal's choices and navigational strategies within the maze, researchers gain insights into spatial cognition and decision-making processes.
 Table Coater
In the realm of surface coating and thin-film deposition, a table coater is a valuable asset for R&D activities. This specialized equipment enables researchers to deposit thin films onto substrates, such as glass, metal, or semiconductors, with precision and repeatability. Table coaters utilize techniques like sputtering, evaporation, and chemical vapor deposition to create uniform and controlled coatings.
The versatility of a table coater allows researchers to experiment with various deposition materials and processes, leading to advancements in optics, electronics, and other technological fields. By fine-tuning coating parameters, such as deposition rate and substrate temperature, scientists can optimize film properties like thickness, adhesion, and conductivity. The table coater's ability to deposit nanoscale coatings opens up possibilities for advanced applications like solar cells, microelectronics, and optical coatings.
Unveiling the Power of Table Coaters
Table coaters are versatile machines widely used in industrial coating processes. They offer precise control over coating parameters, ensuring uniformity and consistency in the application. Table coaters find applications in various industries, ranging from automotive and aerospace to furniture and packaging.
Advantages of Table Coaters
Precision Coating:
Table coaters enable precise application of coatings, ensuring even distribution and thickness control, resulting in enhanced product quality and performance.
Increased Efficiency:
By automating the coating process, table coaters minimize human error, reduce waste, and optimize production throughput, leading to cost savings and improved productivity.
Diverse Coating Capabilities:
Table coaters can handle a wide range of coating materials, including paints, varnishes, adhesives, and protective coatings, making them adaptable to diverse industry needs.
 Conclusion:
The ever-evolving landscape of coating technologies continues to revolutionize numerous industries. R&D coaters empower researchers to develop advanced coating formulations, while radial arm mazes provide valuable insights into animal behavior and cognitive processes. Table coaters, on the other hand, streamline industrial coating operations, enhancing efficiency and product quality. As we move forward, these technologies will undoubtedly play a vital role in driving innovation and shaping the future of coatings.
By embracing the potential of R&D coaters, radial arm mazes, and table coaters, industries can unlock new possibilities, and achieve greater efficiency.
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jean-perry · 2 years ago
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generouslyandrogynousdragon · 10 months ago
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I recognise like 90% of the instruments in this room - the thing on the right is, I believe, an atomic sputterer, which creates a very thin layer of a given material on a surface, often used for producing ETFs (extremely thin films) on the scale of Angstroms or nanometers.
Odd that this one doesn't seem to have nitrogen-filled sealed gloveboxes, but then I work with organic semiconductors, which require that you keep oxygen and humidity (H2O) levels at very low levels while producing the devices, this might be from a different research field.
The wetdecks are identical though, and it looks like there might be a spin-coater in one of them. Looks as though there's also an Angstrom Evaporator, or something that works on similar principles - again, a means of producing atomically thin films, usually of semiconductors. You sublime the metal or organic, then evaporate it by further heating. Under vacuum conditions, the molecules/atoms drift upwards to a target substrate and deposit a film of the material.
One thing that strikes me as odd is that neither of the people in this photo are wearing face masks; that's a requirement for our group's cleanroom, no negotiations. Definitely not a safe working practice if they'll be working with organics - the solvents used for cleaning substrates or removing films to reuse them are dangerous to breathe in in some cases, liquid chloroform as the best example.
It's fantastic for removing organic semiconductors from quartz (fused silica) substrates, but it's incredibly dangerous to breathe in, so without a face mask you're risking lung damage even from the 5-10 minute exposures we have when cleaning quartz with it. It's also why the wetdecks tend to have a mild vacuum in constant operation - aerated solvents are sucked down by the vacuum at the edge of the wetdeck so they don't leak out into the cleanroom in general and become an airborne risk.
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Cleanrooms
Cleanrooms are isolated rooms or chambers designed to limit airborne particles as well as separate hazardous particles from more everyday spaces. They are used in a variety of fields, including life sciences, but in materials science they are largely used in the electronics industry. Cleanrooms are rated and classified based on the size and quantity of particles that they remove from the air. Because people carry and create airborne particles themselves, significant PPE is required before entering a cleanroom.
Sources/Further Reading: (Image source - Wikipedia) (Clestra) (Clean Air Technology) (Mecart) (Colandis)
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vaccoat · 5 years ago
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EFFECT OF BIAS ON STRUCTURE MECHANICAL PROPERTIES AND CORROSION RESISTANCE OF TITANIUM NITRIDE (TINX) FILMS PREPARED MAGNETRON SPUTTERING
Over the past few decades, technological advances have made it possible to deposition of the thin films under vacuum which referred to as “Hard Coatings”. These coatings have different applications due to their special structural and physical properties as protective coatings.
Hard coatings consist of nitrides, carbides and borides of intermediate metals such as titanium or carbon coatings such as diamonds. These coatings have many applications in improving tools (such as cutting and forming machines) and machine parts like valves. Properties of a thin film of hard coatings can be classified as follows:
Structural characteristics such as thickness, crystallography, chemical composition, surface morphology and roughness.
Physical and chemical characteristics such as density, electrical properties, magnetic properties, thermal, optical, oxidizability and corrosion.
Mechanical properties such as hardness, adhesion, mechanical stress and friction.
The selection of appropriate protective coating depends on specific tribological system (workpiece material, machining parameters and tool materials).
Titanium nitrate is one of the materials that has been highly regarded as a hard coating due to its high hardness, high corrosion resistance and thermal stability. In order to be able to use this material as a protective coating, the process of the deposition should be designed in such a way that the deposited thin film in addition of meeting the chemical composition in terms of hardness and other characteristics be a hard coating.
A thin film of this material is produced mainly by RF magnetron sputtering or DC magnetron sputtering. One of the problems with using the sputtering deposition is the “shadowing effect” during the deposition process. This effect is due to the low energy of particles that reach the substrate and as a result there aren’t any deposited layers on the some parts of the substrate. There are some island areas on the growing surface, where are more likely to nucleate and can absorb more particles than other areas around them and grow, like a hill. Adjacent areas (valleys) receive fewer particles due to the shadow of the hill areas. The Shadowing effect produces many problems and defects in the deposited thin film. Among these drawbacks are the creation of small holes and large gaps in the thin film. These defects lead to poor performance of the deposited thin film. To eliminate these defects, some researchers suggested that the effect of “Re-Sputtering” be used by reducing the pressure of the thin film deposition process and increasing the effect of bombing ions. Decrease the pressure leads to increase the voltage and the average particle energy. If the energy of the bombarding particles exceeds the sputtering threshold, the atoms can pass through the hills and they will be deposited in the valley-like regions of the thin film and eventually lead to the formation of a thin film with suitable density.
Regardless of the effect of shadows, the common problem associated with the process of magnetron sputtering method is the low ionization ratio of sputtering materials. The ratio of ionization is usually less than 5% in DC Magnetron Sputter, which is not enough to create a dens and defect less thin film. Some researchers have investigated the creation of a dense thin layer with improved ionization rates using the Unbalanced Magnetron Sputtering and Plasma Enhanced Magnetron Sputtering methods.
In the Un-balanced Magnetron sputtering process, the magnets used in the outer ring at the cathode section are stronger than the central magnets. Thus a number of electrons escape from the trapping magnetic field formed around the Target and move to the substrate. Which result in significant increase in the ion bombardment of the substrate and create new plasma away from the target material and near the substrate. By applying an Un-balanced magnetron, the ion flow that moves to the thin film can be controlled so that the quality of the deposited thin film can be increased dramatically.
In the Enhanced Plasma Magnetron Sputtering method, in addition to the plasma formed around the cathode, the independent plasma created through the ionization and acceleration and expansion of the electrons produced from the hot filaments in the chamber, also used to enhance the quality of the deposited thin film.
In order to improve the quality of the thin film of titanium nitrate for proper performance, its preparation process should be optimized in order to provide a thin film with a structure that can handle the required performance. A lot of studies have been done about the effect of applying bias voltage to the substrate and the quality of the deposited layer and the degree of hardness of the titanium nitrate thin film has been done. Chinese researchers have conducted an investigation into this effect of bias voltage, which resulted in the publication of an article in 2019.
In this research, a 160 nm titanium layer was used to enhance the adhesion of the titanium nitrate layer to the silicon substrate.
According to the results of this study, with the increase of bias negative voltage applied to the substrate from zero to 400 volts, the rate of the deposition significantly decreased from 7.69 to 4.55 nanometers per minute, and the density and quality of the deposited thin film increased. Also, by increasing the negative bias voltage and increasing the transition energy to the growing thin layer, the crystallographic orientation of the thin layer of titanium nitrate plans has been change in four directions from (111) to (200). The crystalline structure of titanium nitrate is similar to the sodium chloride (NaCl) structure. The minimum surface energy is related to the plane (200) and the minimum strain energy is related to the plane (111). Ideally, the growth of a thin layer has the least amount summation of surface energy and pressure energy.
In this study, the effect of the applying bias voltages of different values on the surface morphologically of the deposited titanium nitrate thin film was investigated. Without applying the bias voltage, surface morphology is seen as a typical triangular cone. By changing the bias voltage from -50V to -200V, surface morphology is converted into a laminate structure and the granular structure also appears by increasing the bias voltage to -400 volt. This change in surface morphology leads to densify thin film and decreases porosity.
By increasing the bias voltage, the energy of the ions increases and the re-sputtering phenomenon occurs, resulting in a shadow effect decreasing and the quality of the created thin film increases.
According to the results of the measurements carried out in this study, the hardness of the thin film of titanium nitrate increased with increasing the bias voltage up to -200 volt and then gradually decreasing to -400 volt. The thin filmdeposited under the bias voltage of -200 volt has the highest hardness (12.9 GPa) and the Young module (260.8 GPa).
By increasing the ionization voltage, the ion bombardment of the substrate increases and impurities become more detached. As a result, the film is denser and compression stress is also increased. In addition, the density of the plane with (111) orientation reaches its densifying peak at the bias voltage of -200 volt, which increases the hardness of the thin film.
According to studies conducted by this research group, if the bias voltage is less than -100 volts, there is little effect on the hardness of the thin film of titanium nitrate.
The resistance to corrosion of the thin film deposited by the applied -400 volt bias voltage is more than the layers deposited at the less bias voltages.
By studying the electrical properties of films produced at different bias voltages, it was found that the highest electrical impedance (7.5 × 105 Ω m) is related to the thin film deposited at the bias voltage of -400 volt, which is 10 times greater than the electrical impedance of the thin film deposited without applying the bias voltage.
As a result, by applying negative bias voltage to the substrate which leads to the energy increasing of the collide ions and reducing the shadowing effect in the thin film deposition process, can improve the physical properties of the titanium nitratethin film deposited by the Magnetron Sputtering method, such as hardness, electrical conductivity and corrosion resistance.
To find out more about the results of this study, see the following link:
https://doi.org/10.1016/j.tsf.2019.02.037
References:
B Window and N. Savvides, J. Vac. Sci. Technol. A4(2), 196 (1986).
Z. He, S. Zhang and D. Sun, Thin Solid Films, Volume 676, 30 April 2019, Pages 60-67.
http://bit.ly/32vuKyb
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njmmr · 2 months ago
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pvdir · 3 years ago
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صادرات ۱۰ دستگاه در ۲ ماه اول سال ۱۴۰۰
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شرکت پوشش های نانوساختار، در دو ماه اول سال ۱۴۰۰ موفق به صادرات ۱۰ دستگاه از محصولات لایه نشانی خود، به کشورهای لهستان، آمریکا، اتریش، آلمان، گرانادا، انگلیس و روسیه شده است. با گذشت تنها دو ماه از سال جدید، تلاش اعضای تیم سخت‌کوش شرکت پوشش های نانو ساختار منجر به ساخت و کنترل کیفی و در نهایت ارسال این دستگاه‌ها به کشورهای توسعه‌یافته ای چون آمریکا و آلمان شده است. برای مطالعه بیشتر به لینک زیر مراجعه نمایید: https://bit.ly/3v8hRrQ
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marketmavenresearch · 6 months ago
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tribologicalcoating · 3 years ago
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Magnetron sputtering vacuum coating machine in the best manner possible
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