#IPA Vapor Dryer

[modutek]

Modutek At 2018 Semicon Conference in China

Modutek Corporation, a leading provider of wet bench stations and wet process equipment, will be at the Semicon Conference in Shanghai China from March 14-16, 2018 with their factory representative Laserwort Ltd.  They will be located in Hall N2 at booth 2431. Information about the Semicon Conference can be referenced at http://www.semiconchina.org/ and details on Modutek’s attendance at the conference can be referenced at: Modutek at Semicon Conference in China

Come by the Modutek /Laserwort booth to get information and answer any questions you have about using Wet Bench Process Stations for acid/base, solvent and ozone cleaning or photo resist strip.  In addition Modutek will also provide information about the benefits of their new IPA vapor dryer with the HF last process. Modutek serves customers around the world who require any type of wet processing equipment and builds chemical delivery systems for pharmaceutical, biochemical, solar and semiconductor manufacturing.

Additional details on some of Modutek’s products are listed below:

Single Chamber HF Last IPA Vapor Dryer

Benefits include:

·         Most drying cycles completed within 10 to 15 minutes

·         Very low consumption of IPA

·         No moving parts inside drying chamber eliminating wafer breakage

·         Eliminates watermarks

·         Drying technology can be designed into wet bench eliminating one transfer step

Features include:

·         Single drying chamber for DI water rinsing and IPA vapor drying

·         On board HF metering for precision mix ratios

·         Uses an in situ HF etch process with a rinse step before the IPA drying cycle

·         Filter bypass for contamination control with no cassette contact points

·         Easy to change IPA bottles

·         Handles all process sizes (standard wafer carriers to glass substrates)

Fully-automated Wet Bench Equipment

Benefits include:

·         In house customization to meet customer process requirements

·         Precise automated process execution and reliable repeatability

·         Full automation control with touch screen

·         Improved yield and reduced errors

·         SolidWorks Simulation software for accurate calculation of process parameters

·         All robotics and software design designed in house

·         Complete design, assembly and test at one location to meet your specifications

 Semi-automated Wet Bench Equipment:

Benefits Include:

·         Automation control with touch screen

·         Servo motor automation

·         SolidWorks Flow Simulation software

·         SolidWorks Simulation Professional software

·         All robotics and software designed and developed in house

·         Complete design, assembly and test at one location to meet your specifications

 Manual Wet Bench Equipment:

Benefits Include:

·         High end manual equipment at competitive pricing

·         Meets or exceeds all current safety standards

·         Low cost of ownership

·         Designed to meet any process requirements

·         Can accommodate custom designs and processes

·         Equipment designed for future expansion

All wet bench equipment supports the following applications:

KOH     Etching

Quartz     cleaning

Ozone     Strip

Ozone     Cleaning

SC1     & SC2 (RCA Clean)

Megasonic     Cleaning

BOE     (Buffered Oxide Etching)

MEMs     processing

All     solvent applications

Hot     phosphoric (Nitride Etching)

SPM     Cleaning

Precision     Part Cleaning

Modutek has over 37 years of industry experience and expertise in developing and building wet bench stations and wet process equipment that provides highly reliable results for precision processes. They also provide world-class service, and customer support. Contact Modutek at 866-803-1533 or email Modutek@Modutek.com for a free quote or consultation to discuss your requirements.

[airranekorea]

AIRRANE is a primary pioneer of creative layer plan advancement for gas segment

Nitrogen is the most broadly utilized gas in ventures; its adaptable application ranges from covering and inserting to blast assurance. On-Board Inert Gas Generation System (OBIGGS) ensures fuel tanks on air ships and ships from the danger of fuel vapor blast by supplanting with nitrogen.

·         Fuel tank inserting: OBIGGS

·         Shipboard inserting (FPSO, FLNG, LNG Carrier)

·         Chemical preparing

·         Simple task and low support necessities

·         Iron/aluminum/copper creation and metals preparing

·         Tire swelling

Nitrogen Generator System

Biogas Upgrading

Maturation of biomass, for example, nourishment waste, slurry and fertilizer produces biogas. Ordinarily, unrefined biogas is a blend of about 60% methane (CH4), 40% carbon dioxide (COMsub>2), and a little measure of follow gases, for example, hydrogen sulfide. The pre-treated gas experiences gas partition film to yield biome thane of an a lot higher immaculateness (over 97%) for petroleum gas matrix.

· Biogas (from nourishment squander, compost, distillery, ranch)

· Landfill gas

· Sewage slurry

Power age requires a solid and financially savy answer for the control of different gases. Gas layer is an ideal response for a large number of those difficulties; improving eco-friendliness with oxygen-advanced air, guaranteeing wellbeing through inserting and cleansing frameworks, or diminishing carbon emanation.

· CO2 Capture and Storage

· O2 age for ox fuel ignition

· H2 cleansing for energy component control age

· Inserting framework

· Oxygen expulsion from steam water

Nitrogen Generator System

Microelectronics Semiconductors and show boards fabricating requires high-immaculateness gas control. Indeed, even waste water containing IPA or SF6 can be treated with gas film to deliver progressively thought IPA/SF6 arrangements which can be reused and create extra income.

 ·         IPA/Hydrochloric corrosive purging for reusing

·         Oxygen/Carbon dioxide/Nitrogen controlling for de-ionized (DI) water

·         Anti-static treatment for ultrapure water

·         Clean space for ultra-fine residue evacuation

Nitrogen Generator System

Sustenance and Beverage Long-remove transportation and delayed timeframe of realistic usability necessities have made nitrogen a fundamental piece of the nourishment and drink industry. AIRRANE is likewise attempting to give arrangements which control an assortment of gases to upset the flavor of our regular beverages membrane CO2 injection Korea

· Modified air bundling (MAP)

· Storage tank covering and water treatment

· Controlled air transport and capacity

· Carbonation for Bag-in-Box Beer

· Nitrogen espresso/brew

· Sparkling wine

Nitrogen Generator System

Human services and Air Quality Control From mugginess control and oxygen age frameworks at medical clinics to air purifier and oxygen generator at home, an expanding interest for air quality control will be met with gas layers. Hydrocarbon Separation Membrane

· Air dryer and air purifier

· Humidity controller

· Portable oxygen concentrator

Nitrogen Generator System

Oil and Gas for polluting influence expulsion (SO2, CO2, H2S) from gaseous petrol to the recuperation of hydrogen in petroleum treatment facility process, gas film offers a cost-effective and vitality proficient answers for a wide scope of utilizations in oil and gas ventures.

[modutek]

How Marangoni Drying Produces Superior Surface Conditioning for Wafer Processing

In the final step of silicon wafer processing, wafers often have to be cleaned, rinsed, and dried. They must be free of any contamination or water marks. Contamination in silicon wafers leads to defects in the next processing steps or to high failure as the impurities negatively impacts their quality. IPA drying using the Marangoni drying effect results to dry silicon wafer surfaces without leaving any residues or water marks.

Modutek's standalone IPA vapor dryer is ideal for this drying procedure. There, the IPA vapor is introduced at the top of the drying tank. The Marangoni drying effect takes place -- since the IPA has a lower tension surface than water, it introduces a surface tension gradient where it interfaces with the water on the wafer surface. As a result, the water flows away from the surface of the wafer, leaving it completely clean and dry, with no watermarks whatsoever. The departing water, meanwhile, carries the impurities or particles that are suspended within it.

Modutek's IPA vapor dryer consists of a wide cabinet built of polypropylene construction which is fitted with Teflon (including its valves and tubes). Operation can be controlled by the menu on the touch screen. The dryer options include PVC construction, a manual lid, and a quick dump feature. Modutek can also customize the dryer to meet customer specifications.

Modutek's IPA vapor dryer is cost-effective and can be incorporated in a wet bench process without the need to add drying transfer steps. Read our complete article “How Marangoni Drying Produces Superior Surface Conditioning for Wafer Processing” to learn more about Modutek’s Marangoni drying. You may also contact us at Modutek@Modutek.com if you would like additional information.

[modutek]

Advantages of HF-Last Etching and IPA Drying in One Chamber

After cleaning, a silicon wafer needs to be effectively cleaned and dried with no particle contamination. Clean wafers are important to avoid errors in the next processing steps to produce devices that are of superior quality and free from defects. Using the single chamber HF-last and IPA vapor dryer show a considerable reduction in wafer substrate particle counts.

By the final stage of silicon wafer cleaning, the silicon oxide layer has to be removed and the cleaned wafer dried free from contaminants. However, transferring the wafers from the HF etching process to a separate drying chamber will likely cause the wafers to pick up particles.

Modutek now has a solution to this problem: the single-chamber HF-last and IPA vapor dryer, which can help to significantly reduce the particle count on wafer substrates.

In the single chamber process, Modutek uses IPA vapor drying in a free-standing unit with one DI water rinsing and drying. This method, also called the Marangoni drying technique, results in clean wafer substrates -- having no contamination or watermarks.

Modutek has modified the IPA vapor dryer to include HF (hydrofluoric) acid injection before the start of the standard IPA vapor drying process. The HF acid injection ratio is controlled and provides an etch to bare silicon. When the silicon is etched, it is then rinsed to a controlled pH level. Once the appropriate pH levels are reached, it is then followed by the IPA drying process without moving the silicon wafers. This results in the low particle count on the wafer.

Initial field results from the single chamber HF-Last IPA dyer that Modutek has supplied to customers are showing outstanding results. Within the 0.3 to 5 micron range, fewer than 20 particles (adders) were added to etched substrates which are substantially below what was achieved in previous processes in this field trail.

For more details read the complete article “Advantages of HF-Last Etching and IPA Drying in One Chamber” to learn more about Modutek’s IPA vapor dryers. Call Modtuek at 866-803-1533 or send an email to Modutek@modutek.com if you have questions or would like to get a free consultation.

[modutek]

Tips on Selecting the Right Options for Your Wet Bench Equipment

Modutek wet benches consist of white polypropylene construction with 304 stainless steel construction available for solvent applications. They can be built to any size and length depending on a customer’s requirements. The wet benches include safety features such as safety interlocks, emergency power off buttons, PVC safety shields, and wiring to NFPA 70 and 79.

Fully-automated wet bench stations use SolidWorks Simulation Professional and SolidWorks Flow Simulation software to optimize the semiconductor fabrication process and its performance. This eliminates human operator error by calculating the chemical dosage and operating the station to optimize process performance.

Semi-automated stations have some of the advanced features and precision of an automated station without the higher cost of the fully automated station. Customers can enjoy the benefits of process uniformity and precision of robotic controls as well as the SolidWorks Professional and Flow software at a reduced cost.

Manual wet benches are the most cost-effective way to get the safety features and operating characteristics of the Modutek wet process equipment family. These stations provide an effective start for customers to use wet process equipment. They can later add more automation features into these stations.

Solvent stations have a 304 stainless steel construction with fire suppression. They are available with the same fully automated, semi-automated and manual station options as Modutek’s other wet processing stations. These are for customers with applications that use acetone or IPA or want to do photo resist stripping or EDP etching.

Time-saving dry to dry wet process equipment removes transfers and increases throughput and yield. Customers who want to simplify this process may choose this equipment. Read more details in the article on the site titled “Tips on Selecting the Right Options for Your Wet Bench Equipment.”

[modutek]

Modutek Receives Order for Single Chamber HF Last/IPA Vapor Dryer

Modutek Corporation has just received a customer order for a new innovative IPA vapor dryer. It includes HF (hydrofluoric acid) injection as a first procedure before moving on to the standard IPA vapor drying process. This step leads to the oxide etch to bare silicon. The hydrophobic wafers are then rinsed to pH controlled level. When the pH reaches the appropriate level, the IPA vapor dry process starts in the same chamber. This eliminates the need to move the Hydrophobic wafers to a separate drying station. The new IPA vapor dryer improves yields by minimizing or entirely removing water spots and reduces the defects by particle neutral-drying.

Modutek’s IPA vapor dryer features a single drying chamber for DI water rinsing and IPA vapor drying. It also has an onboard HF metering which controls mix ratios with precise measurements. The oxide etch with the IPA vapor drying uses a process with rinsing controlled pH before the IPA drying cycle starts. It also includes a filter bypass for contamination control. The IPA vapor's standard one-gallon bottles are also easy to change at deck level and the top entry of the IPA vapor guarantees even distribution. The absence of moving parts in the dryer will ensure no breakage of the wafer.

Modutek's dryer cycles last from 10 to 15 minutes and has reduced consumption on IPA. Modutek also does custom installations and thus can do designs of the IPA dryer to meet various requirements of any application. The entire press release article can be read from the following link: http://www.modutek.com/modutek-receives-order-for-single-chamber-hf-lastipa-vapor-dryer/

[modutek]

Wet Processing Equipment Applications

Modutek provides technologically advanced yet cost-effective wet processing equipment and solutions that produce high-quality output. Applications include wafer etching, cleaning, drying, metal etching and stripping. Particular solutions include KOH etch and nitride etch. The rotary wafer etching system has the ability to etch, clean, reclaim, develop, and strip semiconductor wafers and substrates. It features a dual tank design with a transfer between tanks for etching and then cleansing or rinsing.

Modutek’s vacuum metal etcher can etch aluminum layers on semiconductor wafers with high precision. It is fully automated, and etches aluminum in a vacuum to remove hydrogen bubbles that impede the etching process and generate "snow" and bridging of the etched wafers.

Modutek’s IPA Vapor Dryer cleans dry wafers without creating water spots. It can utilize ozone in the drying chamber to remove organic contaminants. Most drying cycles can be done in 10 to 15 minutes.

Modutek's state-of-the-art wet processing equipment is designed to meet the applications of any semiconductor manufacturing or research facility with either standard products or custom-designed solutions. If you need help with selecting the right equipment for your application, contact Modutek at 866-803-1533.

[modutek]

How the IPA Vapor Dryer Improves Wafer Processing Time

The IPA Vapor Dryer from Modutek meets the demands of facilities and process engineers who are continually looking for ways to improve silicon wafer processing time. This system includes the SolidWorks Flow Simulation and Simulation Professional software to ensure improved operations and drying time with one or two 150-450mm cassettes or glass substrates.

Modutek’s IPA Vapor Dryer design has both rinsing and drying capabilities. This Marangoni drying system incorporates a single chamber to facilitate the final stages of the cleaning process. The system provides high throughput along with other advantages including:

·         elimination of watermarks on substrates and hydrophilic/hydrophobic films with no feature damage

·         15-minute batch drying for most applications

·         secure system interface bottle change that allows for fast, deck-level applications

The IPA Vapor Dryer also has a variety of additional safety features and optional features to provide optimal wafer processing with wet processing equipment. If you have questions, call 866-803-1533 or send an email to sales@modutek.com for answers.

[modutek]

Modutek Corporation Is Featured at China's Semicon Conference

ModutekCorporation is pleased to announce that it will have a factory representative at the Semicon Conference in Shanghai, China. The conference, which will be attended by numerous exhibitors in the semiconductor manufacturing industry, is March 17-19 2015. Modutek will be at booth 3243, Hall W3, Shanghai.

Modutek will provide information and answer questions regarding their manufacturing equipment with Laserwort who is their local representative in China. The following lists the products that will be featured in the upcoming conference:

· Semi-automated Wet Bench Equipment

· Fully-automated Wet Bench Equipment

· IPA Vapor Dryer

Learn more about the conference by going to this website semiconchina.org

For many years, Modutek has been a top provider of semiconductor manufacturing equipment and wet bench stations. The company also provides world-class service, set-up and customer support. Contact them at 866-803-1533 or by email from their site: http://www.modutek.com/

[modutek]

Modutek provides many configurations for their Dry to Dry Process Equipment. Discover more here http://www.modutek.com/what-moduteks-dry-to-dry-etching-process-equipment-provides/

[modutek]

Modutek has been designing/manufacturing superior wet processing equipment for over 30 years. http://www.modutek.com/batch-etching-processes-supported-by-moduteks-wet-processing-equipment/

[modutek]

Discover why your company needs to consider Modutek's Wet Processing Equipment http://www.modutek.com/why-you-need-moduteks-complete-line-of-wet-processing-equipment/

[modutek]

The Modutek Dry to Dry Etching Process Equipment is fully automated and customizable for your application. Read about it here http://www.modutek.com/what-moduteks-dry-to-dry-etching-process-equipment-provides/

[modutek]

Learn How Your Company Can Benefit from Modutek's Full Line of Wet Processing Equipment http://www.modutek.com/why-you-need-moduteks-complete-line-of-wet-processing-equipment/

[modutek]

What Configuration of Dry to Dry Etching Process Equipment Does Your Company Need? Modutek Provides Many Configurations and Benefits to Meet Your Needs

What does the Modutek Dry to Dry Etching Process Equipment provide? You can learn more by reading this article http://www.modutek.com/what-moduteks-dry-to-dry-etching-process-equipment-provides/

[modutek]

Modutek's IPA Vapor Dryer, or Marangoni Drying, is a viable alternative to other drying processes. If you want to learn more contact us at 866-803-1533

Modutek's IPA Vapor Dryer, also called Marangoni Drying, is an alternative for semiconductor manufacturing. Read this http://www.modutek.com/discover-the-advantages-of-moduteks-ipa-vapor-dryer/